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Xingwu Wang Prof. Electrical Engineering |
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| Alfred University Contact Info | |||||||||||||
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| Education | |||||||||||||
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B.S.: Electrical Engineering Harbin Naval Engineering Institute, 1978 M.S.: Physics Hangzhou University, 1981 Ph.D.: Physics SUNY Buffalo, 1987 |
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| Background | |||||||||||||
| Areas of Concentration | |||||||||||||
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Main focus is related to thin film coatings. Coating facility includes: 1. ion-assisted electron-beam deposition; 2. pulsed DC, DC and RF sputtering; and 3. RF plasma aerosol mist deposition. Thin film materials include oxides and nitrides. Substrate materials are single crystals, ceramics and glass. Substrate shapes can be flat, cylindrical and wire-like. | |||||||||||||
| Current Research | |||||||||||||
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Ion-assisted electron beam deposition of oxide films.
Pulsed DC sputtering of nitride films. RF plasma aerosol mist deposition of oxides. |
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