Faculty and Staff
Prof. Electrical Engineering
|Alfred University Contact Info|
B.S.: Electrical Engineering
Harbin Naval Engineering Institute, 1978
Hangzhou University, 1981
SUNY Buffalo, 1987
|Areas of Concentration|
Main focus is related to thin film coatings. |
Coating facility includes:
1. ion-assisted electron-beam deposition;
2. pulsed DC, DC and RF sputtering; and
3. RF plasma aerosol mist deposition.
Thin film materials include oxides and nitrides. Substrate materials are single crystals, ceramics and glass. Substrate shapes can be flat, cylindrical and wire-like.
Ion-assisted electron beam deposition of oxide films.
Pulsed DC sputtering of nitride films.
RF plasma aerosol mist deposition of oxides.