Layer Mask at the Fosdick-Nelson Gallery
Photo Credit: David Cutler-Kennedy, Climbing Out (VI), 2019, Inkjet transfer, acrylic and Permalac on canvas, 47” x 28” x 3”Dates: Friday, September 13 - Friday, October 18 Location: Fosdick-Nelson Gallery Sponsored by: School of Art and Design
Layer Mask, an exhibition featuring new work including painting, photography, sculpture and video, opens Friday, September 13, at the Fosdick-Nelson Gallery on the Alfred University campus.
An opening reception for Layer Mask will be held at the gallery Friday, September 13 from 6:00 pm - 8:00 pm; the exhibition will remain on view through Friday, October 18.
Lydia McCarthy, associate professor of photography in the School of Art and Design, organized the exhibition. “Masks are used to obscure, protect and disguise. They hide and deceive: decorative, playful, repulsive, terrifying. In layering and masking, there is freedom and control, enabling manipulation. Throughout our lives we build, modify and reinforce masks we wear – culturally created masks that keep us from connecting with the complicated, multifaceted moment that we are in. They reduce our inner life to a honed and limited exterior,” McCarthy said her exhibition statement.
“The works in Layer Mask exist in paradox, masking and layering material to reveal a tactile, messy, colorful, at times disturbing, reality. These artists re-complicate and force confrontation with the present moment, undermining notions of what is acceptable. The surface reveals hidden layers, remnants of what lies beneath, truths to be discovered with effort and time.”
Participating artists include: Ellen Bahr, Amy Brener, Melissa Brown, Whitney Hubbs, David Kennedy-Cutler, Tatiana Kronberg, Michael Mahalchick, Lydia McCarthy, Linda Sormin, and Ryan Wallace.
Fosdick-Nelson Gallery hours are:
Monday through Friday from 11:00 am - 4:00 pm
Saturday and Sunday from 1:00 pm - 3:00 pm
For more information contact Director, Sharon McConnell at firstname.lastname@example.org.